Patent · US Active

Nanoimprint method and apparatus

US8029717B2 · kind B2 · utility

5Cited by
0References
1Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 17, 2006
Grant dateOct 4, 2011
Priority date
Expiry dateMar 17, 2027

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K2203/167
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

There is provided a nanoimprint apparatus. The nanoimprint apparatus transfers a pattern formed on a surface of a mold to a transfer layer which is formed partially or entirely on a side surface of a substantially cylindrical or columnar substrate. The nanoimprint apparatus includes: a first jig which is in contact with the substrate 102; a second jig which rotatably supports the first jig; a press unit which is connected to the second jig to press the substrate on the mold 104 through the first and second jigs; and a movable holding unit which holds the mold and moves the mold 104 in a direction substantially perpendicular to a pressing force.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.