Method of fabricating structures based on nanoparticles
US8029722B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 6, 2008 |
| Grant date | Oct 4, 2011 |
| Priority date | — |
| Expiry date | Oct 13, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/254
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
This publication discloses a method for creating nanoscale formations. According to the method, a filler matrix and first nanoparticles embedded in the filler matrix, and two conductive electrodes are superimposed on the insulating material layer. According to the invention, a voltage is applied between the conductive electrodes, a filler matrix is used and first nanoparticles have substantially different electrical properties in order to induce self-organized localized contact creation when said voltage is applied. Potential applications of the invention include e.g. parallel-plate capacitor structures based on metal-oxide nanoparticles, such as memory cells, and high-permittivity/tunable capacitors.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.