Patent · US Active

Spray method for producing semiconductor nano-particles

US8030194B2 · kind B2 · utility

0Cited by

6References

26Claims

0Family size

Assignee

Technion Research & Development Foundation Limited · IL

Inventors

Lilac Amirav · Hod HaSharon, IL
Efrat Lifshitz · Haifa, IL

Key dates

Filing date	Sep 22, 2005
Grant date	Oct 4, 2011
Priority date	—
Expiry date	Apr 1, 2027

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S977/84
WIPO fieldMaterials, metallurgy
WIPO sectorChemistry

Abstract

A method is provided for producing semiconductor nanoparticles comprising: (i) dissolving a semiconductor compound or mixture of semiconductor compounds in a solution; (ii) generating spray droplets of the resulting solution of semiconductor compound(s); (iii) vaporizing the solvent of said spray droplets, consequently producing a stream of unsupported semiconductor nanoparticles; and (iv) collecting said unsupported semiconductor nanoparticles on a support.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.