Coaxial plasma arc vapor deposition apparatus and method
US8038858B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 7, 2005 |
| Grant date | Oct 18, 2011 |
| Priority date | — |
| Expiry date | Sep 9, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/34
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An apparatus for deposition of plasma reaction films includes a substrate for the deposition of either thin or thick films. The substrate also allows for a film deposition which adheres to the substrate, and also films which may be removed after deposition. The cathode may be fabricated from individual wires, or it may be fabricated from a single conductor. A macro-particle filter which preferentially traps larger particles may be introduced between a porous cathode and the deposition surface. The macro-particle filter may also carry electrical current as is useful for generating a magnetic field such that a Lorentz force acts preferentially on ionized particles, allowing them to pass through the filter while trapping macroparticles that are not influenced by the magnetic field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.