Conductive oxide-deposited substrate and method for producing the same, and MIS laminated structure and method for producing the same
US8039405B2 · kind B2 · utility
1Cited by
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11Claims
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Key dates
| Filing date | Jan 30, 2009 |
| Grant date | Oct 18, 2011 |
| Priority date | — |
| Expiry date | Nov 5, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24628
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for producing a conductive oxide-deposited substrate including depositing a conductive oxide thin film over a substrate, subjecting the conductive oxide thin film to heat treatment by irradiating with a condensed laser beam so as to be thermally changed in part, and subjecting the conductive oxide thin film to etching treatment so as to remove a part which has not been thermally changed, wherein the conductive oxide thin film absorbs the laser beam, and at least a part of the conductive oxide thin film is an amorphous phase.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.