Installation for exposing a cinematographic film from digital images
US8039825B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 22, 2009 |
| Grant date | Oct 18, 2011 |
| Priority date | — |
| Expiry date | May 28, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03B27/475
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
This installation includes: a light source; means for storing film photoresist for exposure and exposed photoresist; a film carrier for positioning said film photoresist at an exposure plane; a projection lens capable of projecting the digital images at the exposure plane; a liquid crystal matrix where the various digital images to be exposed are displayed; a retractable mirror oriented at 45° to an optical axis of the projection lens; and an image analysis device positioned symmetrically to said exposure plane with regard to the plane containing said mirror when the latter is in place on the optical axis. When said mirror is positioned on the optical axis, the image analysis device is suitable for receiving the image transmitted by the liquid crystal matrix issuing from the projection lens. The signals thereby detected are processed using an associated software, for setting the characteristics of the optical members of the installation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.