Manufacturing method for a thin film transistor-liquid crystal display having an insulating layer exposing portions of a gate island
US8040452B2 · kind B2 · utility
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7Claims
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Key dates
| Filing date | Mar 23, 2011 |
| Grant date | Oct 18, 2011 |
| Priority date | — |
| Expiry date | Mar 23, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/136231
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pixel unit of TFT-LCD array substrate and a manufacturing method thereof is disclosed. In the manufacturing method, besides a first insulating layer and a passivation layer, a second insulating layer is adopted to cover the gate island, and forms an opening on the gate island to expose the channel region, the source region and the drain region of the TFT. A gray tone mask and a photoresist lifting-off process are utilized to perform patterning, so that the TFT-LCD array substrate can be achieved with just three masks.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.