Methods for forming gas barriers on electronic devices
US8043462B2 · kind B2 · utility
0Cited by
8References
25Claims
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Key dates
| Filing date | Apr 1, 2009 |
| Grant date | Oct 25, 2011 |
| Priority date | — |
| Expiry date | Oct 25, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T156/1093
Abstract
A method for forming gas barriers on electronic devices is provided. The fabrication method includes: providing a first substrate having at least one electronic device thereon; providing a second substrate and forming a gas barrier over the second substrate; disposing the second substrate over the first substrate, wherein the gas barrier faces the electronic device; providing an electromagnetic wave light source over the second substrate; and irradiating the second substrate by the electromagnetic wave light source to transfer the gas barrier to the electronic device and cover the electronic device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.