Patent · US Active

Methods for making and using halosilylgermanes

US8043980B2 · kind B2 · utility

2Cited by
4References
76Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 2, 2008
Grant dateOct 25, 2011
Priority date
Expiry dateMay 3, 2028

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S438/933
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

The invention provides compounds of, and methods for the preparation of compounds of, the molecular formula, SixGeyHzaXa; wherein X is halogen, and x, y, z, and a are defined herein, and methods for the deposition of high-Ge content Si films on silicon substrates using compounds of the invention.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.