Methods for making and using halosilylgermanes
US8043980B2 · kind B2 · utility
2Cited by
4References
76Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 2, 2008 |
| Grant date | Oct 25, 2011 |
| Priority date | — |
| Expiry date | May 3, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/933
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The invention provides compounds of, and methods for the preparation of compounds of, the molecular formula, SixGeyHzaXa; wherein X is halogen, and x, y, z, and a are defined herein, and methods for the deposition of high-Ge content Si films on silicon substrates using compounds of the invention.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.