Operating a plasma process
US8044595B2 · kind B2 · utility
36Cited by
46References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | May 26, 2009 |
| Grant date | Oct 25, 2011 |
| Priority date | — |
| Expiry date | May 20, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0206
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for operating one or more plasma processes in a plasma chamber, with at least two power supplies, the method comprising the following process steps: transferring the at least one signal and/or the data to a plasma process-regulating device and/or to one or more other power supplies or to one or more of the arc diverter devices associated with the other power supplies.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.