Support plate, exposure apparatus having the support plate, and a device manufacturing method using the exposure apparatus
US8045138B2 · kind B2 · utility
1Cited by
1References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 26, 2008 |
| Grant date | Oct 25, 2011 |
| Priority date | — |
| Expiry date | Nov 12, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus exposes a substrate through a liquid. The apparatus includes a stage that holds the substrate and moves, and a support plate disposed on the stage and around the periphery of the substrate and supporting the liquid together with the substrate. The support plate includes a liquid-repellent structure portion on the surface of which is formed a texture repellent to the liquid, and a flat portion on the surface of which is formed a film repellent to the liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.