Methods and systems for determining a baseline during image processing
US8050516B2 · kind B2 · utility
2Cited by
31References
25Claims
0Family size
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Key dates
| Filing date | Sep 13, 2007 |
| Grant date | Nov 1, 2011 |
| Priority date | — |
| Expiry date | Aug 17, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06V20/693
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method of determining a plurality of positions associated with a plurality of reaction chambers of a microfluidic device includes a) providing a baseline image; b) providing a template image of a reaction chamber; and c) selecting a region of the baseline image. The method also includes d) performing a matching process including matching the template image to one or more portions of the region of the baseline image; e) determining a position of a first chamber; and f) predicting a position of a second chamber. The method further includes g) repeating steps c) through f) for subsequent chambers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.