Device and method for patterning structures on a substrate
US8053037B2 · kind B2 · utility
0Cited by
3References
7Claims
0Family size
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Key dates
| Filing date | Nov 9, 2004 |
| Grant date | Nov 8, 2011 |
| Priority date | — |
| Expiry date | Jan 11, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31759
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A device for patterning structures on a substrate includes an imaging device having a scanning tip, a light emitting device, and a space around the scanning tip. The space comprises a vapor of a material which is suitable for Chemical Vapor Deposition onto the substrate when decomposed. The light emitting device is adapted to emit a light beam, which has an intensity not capable to decompose the vapor, onto the scanning tip in such a way that an electromagnetic field induced by the light beam near the scanning tip is high enough to decompose the vapor.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.