Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US8053159B2 · kind B2 · utility
4Cited by
46References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 18, 2003 |
| Grant date | Nov 8, 2011 |
| Priority date | — |
| Expiry date | Nov 18, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/091
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An absorbing composition is described herein that includes at least one inorganic-based compound, at least one absorbing compound, and at least one material modification agent. In addition, methods of making an absorbing composition are also described that includes: a) combining at least one inorganic-based compound, at least one absorbing compound, at least one material modification agent, and one or more solvents to form a reaction mixture, wherein the at least one material modification agent comprises at least one acid and water; and b) heating the reaction mixture to form an absorbing material, a coating or a film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.