Patent · US Active

Method of fabricating a whispering gallery mode resonator

US8057283B1 · kind B1 · utility

0Cited by

4References

20Claims

0Family size

Assignee

The United States of America as represented by the Administrator of the National Aeronautics and Space Administration · US

Inventors

Anatoliy Savchenkov · Glendale, US
Andrey B. Matkso · Pasadena, US
Vladimir Iltchenko · Tustin, US
Lute Maleki · Pasadena, US

Key dates

Filing date	May 13, 2008
Grant date	Nov 15, 2011
Priority date	—
Expiry date	Sep 15, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG02B6/29341
WIPO fieldMachine tools
WIPO sectorMechanical engineering

Abstract

A method of fabricating a whispering gallery mode resonator (WGMR) is provided. The WGMR can be fabricated from a particular material, annealed, and then polished. The WGMR can be repeatedly annealed and then polished. The repeated polishing of the WGMR can be carried out using an abrasive slurry. The abrasive slurry can have a predetermined, constant grain size. Each subsequent polishing of the WGMR can use an abrasive slurry having a grain size that is smaller than the grain size of the abrasive slurry of the previous polishing iteration.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.