Patent · US Active

Implant having a surface-proximal magnesium-containing diffusion layer and associated production method

US8057536B2 · kind B2 · utility

3Cited by

0References

11Claims

0Family size

Assignee

BIOTRONIK VI Patent AG · CH

Inventors

Heinz Mueller · Erlangen, DE
Peter Uggowitzer · Ottenbach, CH
Joerg Loeffler · Greifensee, CH

Key dates

Filing date	Jun 13, 2008
Grant date	Nov 15, 2011
Priority date	—
Expiry date	Sep 2, 2028

Classification

Technology area (CPC A)Human Necessities
CPC primaryA61L31/088
WIPO fieldMedical technology
WIPO sectorInstruments

Abstract

An implant comprising an implant material forming a base made of one or more metallic elements; a diffusion layer covering the base made of at least one of the metallic elements of the implant material and at least magnesium; and, optionally, a metal layer covering the diffusion layer made of magnesium or a biocorrodible magnesium alloy.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.