Method for gettering oxygen and water during vacuum deposition of sulfide films
US8057856B2 · kind B2 · utility
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11References
19Claims
0Family size
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Key dates
| Filing date | Mar 10, 2005 |
| Grant date | Nov 15, 2011 |
| Priority date | — |
| Expiry date | May 23, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/0623
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention is a method for gettering undesirable atomic species from a vaporizing atmosphere during deposition of multi-element thin film phosphor compositions. The method comprises vaporizing one or more getter species immediately prior and/or simultaneously during the deposition of a phosphor film composition within a deposition chamber. The method improves the luminance and emission spectrum of phosphor materials used for full colour ac electroluminescent displays employing thick film dielectric layers with a high dielectric constant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.