Patent · US Active

Electrostatic force assisted deposition of graphene

US8057863B2 · kind B2 · utility

6Cited by
1References
12Claims
0Family size

Assignee

Inventor

Key dates

Filing dateDec 4, 2009
Grant dateNov 15, 2011
Priority date
Expiry dateJul 16, 2030

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B32/19
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

An embodiment of a method of depositing graphene includes bringing a stamp into contact with a substrate over a contact area. The stamp has at least a few layers of the graphene covering the contact area. An electric field is developed over the contact area. The stamp is removed from the vicinity of the substrate which leaves at least a layer of the graphene substantially covering the contact area.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.