Electrostatic force assisted deposition of graphene
US8057863B2 · kind B2 · utility
6Cited by
1References
12Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 4, 2009 |
| Grant date | Nov 15, 2011 |
| Priority date | — |
| Expiry date | Jul 16, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B32/19
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
An embodiment of a method of depositing graphene includes bringing a stamp into contact with a substrate over a contact area. The stamp has at least a few layers of the graphene covering the contact area. An electric field is developed over the contact area. The stamp is removed from the vicinity of the substrate which leaves at least a layer of the graphene substantially covering the contact area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.