Patent · US Active

Method for forming a hermetically sealed cavity

US8062497B2 · kind B2 · utility

27Cited by
3References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 28, 2007
Grant dateNov 22, 2011
Priority date
Expiry dateAug 8, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/249953
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

One inventive aspect relates to a method for forming hermetically sealed cavities, e.g. semiconductor cavities comprising fragile devices, MEMS or NEMS devices. The method allows forming hermetically sealed cavities at a controlled atmosphere and pressure and at low temperatures, for example, at temperatures not exceeding about 200° C. The method further allows forming sealed cavities with short release times, for example, release times of about a few minutes to 30 minutes. The method may, for example, be used for zero level packaging of MEMS or NEMS devices.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.