Parallel plate electrode arrangement apparatus and method
US8067747B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 22, 2006 |
| Grant date | Nov 29, 2011 |
| Priority date | — |
| Expiry date | Mar 30, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N27/622
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A system for guiding an ion beam along an axis (Z), comprises at least one section having upper flat plate strip electrodes (Iu, 2u, 3u, 4u and 5u) and lower flat plate strip electrodes (Id, 2d, 3d, 4d and 5d) for producing at least one electric field of substantially symmetric in a parallel direction and substantially antisymmetric in a perpendicular direction with respect to a plane including a beam axis and a fringe-field boundary that is located at the end of the at least one section.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.