Method of measuring a bevel angle in a write head
US8074345B1 · kind B1 · utility
149Cited by
4References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 18, 2009 |
| Grant date | Dec 13, 2011 |
| Priority date | — |
| Expiry date | Oct 16, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/49052
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method of measuring a bevel angle in a write pole comprises the step of providing a mask over a wafer containing the write pole. The mask has a first opening over the write pole and a second opening over a sacrificial region of the wafer. The sacrificial region comprises a same material as the write pole. The method further comprises the steps of performing a beveling operation on the write pole and the sacrificial region to form a first bevel in the write pole and a second bevel in the sacrificial region, and measuring an angle of the second bevel in the sacrificial region to determine the bevel angle of the write pole.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.