Positive-working imageable elements with chemical resistance
US8076052B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 10, 2008 |
| Grant date | Dec 13, 2011 |
| Priority date | — |
| Expiry date | Jan 16, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41C2210/262
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
Single- and multi-layer positive-working imageable elements include a first polymeric binder that is soluble in an alkaline developer upon exposure to imaging radiation and a radiation absorbing compound. The first polymeric binder comprises a backbone to which are attached pendant groups represented by the following Structure (I):wherein R1 and R2 are independently hydrogen or alkyl groups having 1 to 8 carbon atoms or aryl groups having 6 or 10 carbon atoms in the carbocyclic ring, L is a direct bond or a linking group having at least 1 carbon atom and optionally one or more nitrogen, oxygen, and sulfur atoms in the linking chain, and X is oxy, thio, or —NR— wherein R is hydrogen or an alkyl group having 1 to 8 carbon atoms or an aryl group having 6 or 10 carbon atoms in the carbocyclic ring.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.