Patent · US Active

Method for the production of photo-patterned carbon electronics

US8076218B2 · kind B2 · utility

0Cited by

18References

15Claims

0Family size

Assignee

BAE Systems Information and Electronic Systems Integration Inc. · US

Inventors

Daniel N. Carothers · Oro Valley, US
Rick Thompson · West Burlington, US

Key dates

Filing date	Jul 6, 2009
Grant date	Dec 13, 2011
Priority date	—
Expiry date	Jan 14, 2030

Classification

Technology area (CPC H)Electricity
CPC primaryH10K85/221
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A method for the manufacture of carbon based electrical components is herein presented. In the method a wafer substrate is provided upon which a first layer of carbon based semiconductor is deposited. The first layer of carbon based semiconductor is introduced to a first doping agent precursor and the first doping agent precursor and first layer of carbon based semiconductor are irradiated with light having a wavelength in the ultraviolet spectrum thereby selectively doping areas of the first layer of carbon based semiconductor.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.