Methods for altering one or more parameters of a measurement system
US8077960B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 6, 2011 |
| Grant date | Dec 13, 2011 |
| Priority date | — |
| Expiry date | Jan 6, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2015/1497
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods for altering one or more parameters of a measurement system are provided. One method includes analyzing a sample using the system to generate values from classification channels of the system for a population of particles in the sample. The method also includes identifying a region in a classification space in which the values for the populations are located. In addition, the method includes determining an optimized classification region for the population using one or more properties of the region. The optimized classification region contains a predetermined percentage of the values for the population. The optimized classification region is used for classification of particles in additional samples.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.