Patent · US Active

Device for gassing a liquid

US8079572B2 · kind B2 · utility

2Cited by

11References

15Claims

0Family size

Assignee

Koch Membrane Systems, Inc. · US

Inventors

Stefan Schaefer · Wetzlar, DE
Klaus Vossenkaul · Aachen, DE
Dirk Volmering · Aachen, DE
Darren Lawrence · Hoevelaken, NL

Key dates

Filing date	Sep 17, 2007
Grant date	Dec 20, 2011
Priority date	—
Expiry date	Aug 14, 2028

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB01D2321/2066
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

A device for gassing a liquid, particularly for membrane facilities used in immersion operation, has a gas supply channel and at least one gas lance from which a gas flow exits in gassing operation. The gas lance is connected to the gas supply channel via at least one connection channel including a first mouth area on the side of the gas lance and a second mouth area on the side of the gas supply channel and generating as a throttle a flow pressure loss of the gas flow entering the gas lance. Below the first mouth area an extension section is provided, which adjoins the gas lance and has an opening below the first mouth area.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.