Patent · US Active

Method for cleaning a substrate

US8080108B2 · kind B2 · utility

3Cited by
4References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 21, 2005
Grant dateDec 20, 2011
Priority date—
Expiry dateAug 21, 2027

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/24612
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A method for the continuous vacuum cleaning of a substrate, characterized in that:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.