Method for double-dip substrate spin optimization of coated micro array supports
US8080279B2 · kind B2 · utility
0Cited by
24References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 4, 2007 |
| Grant date | Dec 20, 2011 |
| Priority date | — |
| Expiry date | Oct 18, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01L2300/16
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The present invention discloses a method for preparing a substrate coated support for use in micro-array devices. The method of the present invention comprises the steps of applying a first coat of substrate to a support, making the substrate coating ramp by subjecting the coated support to centripetal forces, adding a second coat of substrate to the resulting support having a ramping planar coat and subjecting the coated support to centripetal forces for a second time to produce a substrate coated membrane in which the thickness of the substrate layer is uniform across the entire coated surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.