Patent · US Active

In-line process for making thin film electronic devices

US8080366B2 · kind B2 · utility

0Cited by
5References
30Claims
0Family size

Assignee

Inventors

Key dates

Filing dateFeb 23, 2007
Grant dateDec 20, 2011
Priority date
Expiry dateSep 20, 2030

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K59/12
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An in-line process for making a thin film electronic device on a substrate is described comprising the steps of: a) depositing a structurable layer onto a substrate; b) depositing a patternable material onto the structurable layer in a first pattern; and c) etching the structurable layer in areas uncovered by the patternable material. The steps are carried out without intermediate exposure of the substrate to ambient air.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.