Patent · US Active

Detecting chemical and biological impurities by nano-structure based spectral sensing

US8081308B2 · kind B2 · utility

9Cited by
8References
38Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 21, 2009
Grant dateDec 20, 2011
Priority date
Expiry dateJul 14, 2030

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N21/65
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method is disclosed for providing quality assurance in an industrial process. The method includes obtaining a manufacturing material from the industrial process, allowing the manufacturing material to contact with a nano-scale surface, which allows the harmful substance to adsorb to the nano-scale surface. The method also includes obtaining a Raman spectrum from the manufacturing material and the nano-scale surface using a spectrometer, searching for, using a spectral analyzer, a spectral signature of a harmful substance in a predetermined spectral region in the Raman spectrum to determine the existence of the harmful substance in the manufacturing material, determining the concentration of the manufacturing material if the spectral signature is found in the Raman spectrum, and rejecting the manufacturing material from the industrial process if the concentration of the manufacturing material is determined to be above a predetermined tolerance level.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.