Fabrication method of size-controlled, spatially distributed nanostructures by atomic layer deposition

US8084087B2 · kind B2 · utility

Assignees

• The Board of Trustees of the Leland Stanford Junior University · US
• HONDA MOTOR CO., LTD. · JP

Inventors

• Stacey F. Bent · Stanford, US
• Rong Chen · Sunnyvale, US
• Xirong Jiang · Stanford, US
• Marja N. Mullings · Stanford, US
• Yuji Saito · Tokyo, JP

Key dates

• Filing date: Feb 14, 2008
• Grant date: Dec 27, 2011
• Expiry date: Oct 19, 2030

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C16/45525
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A method of growing spatially-separated and size-controlled particles on substrate surfaces is provided. The method utilizes chemical modification of the substrate surface, an atomic layer deposition (ALD) system, providing a modified layer to the substrate surface and providing an ALD material for nanoparticle deposition. The method induces a Volmer-Weber growth method, where islands of the nanoparticles are formed on the surface. The modified layer controls a number of nucleation sites on the surface, where controlling the number of ALD cycles limits an amount of deposited the material for discrete the nanoparticles. The modified layer can include self-assembled monolayers, modified hydrophobicity of the surface, H-terminated surfaces, and varying functional groups within the modified layer, where thermally attached alkenes, photochemically attached alkenes, thermally attached alkynes or photochemically attached alkynes are attached to the H-terminated surfaces, and the density of the nucleation sites of the nanoparticles are thereby managed.