Composition for removing photoresist and method of manufacturing an array substrate using the same
US8084184B2 · kind B2 · utility
1Cited by
8References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 26, 2008 |
| Grant date | Dec 27, 2011 |
| Priority date | — |
| Expiry date | Feb 19, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/425
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A composition for removing a photoresist includes a) an amine compound having a cyclic amine and/or a diamine, b) a glycol ether compound, c) a corrosion inhibitor and d) a polar solvent. The composition further includes a stripping promoter. Further disclosed is a method of manufacturing an array substrate using the composition for removing a photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.