Reducing side lobes within optical irradiance distributions used to selectively expose photosensitive surface
US8085289B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 24, 2008 |
| Grant date | Dec 27, 2011 |
| Priority date | — |
| Expiry date | Apr 10, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B27/58
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
An optical beam is selectively output towards a scanner in accordance with image data for a scan line of an image. The optical beam has a beam irradiance distribution that is elliptical in shape. The optical beam passes through an aperture stop, ordinarily creating side lobes within a focus irradiance distribution of the optical beam. The scanner scans the optical beam to form the scan line on a photosensitive surface by selectively exposing positions along the scan line in accordance with image data. The optical beam is modified before it reaches the photosensitive surface to substantially remove the side lobes that have been created within the focus irradiance distribution and/or to substantially prevent the side lobes from being created within the focus irradiance distribution of the optical beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.