Organic thin film transistors
US8089065B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 3, 2008 |
| Grant date | Jan 3, 2012 |
| Priority date | — |
| Expiry date | Apr 3, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/233
Abstract
A method of forming an organic thin film transistor comprising: providing a structure comprising source and drain electrodes with a channel region therebetween, a gate electrode, and a dielectric layer disposed between the source and drain electrodes and the gate electrode; and patterning the dielectric layer using the source and drain electrodes as a mask to form a region of dielectric material in the channel region which is thinner than regions of dielectric material adjacent the channel region.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.