Ultra-short pulse laser system and method for producing femtosecond or picosecond pulses
US8089998B2 · kind B2 · utility
1Cited by
2References
16Claims
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Key dates
| Filing date | May 26, 2009 |
| Grant date | Jan 3, 2012 |
| Priority date | — |
| Expiry date | May 26, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/1675
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An ultra-short pulse laser system comprising an amplifying laser medium for producing a laser emission, a laser resonator having at least one resonator mirror and a pump source has a gas-filled section with a filling gas, the latter consisting of a single gas or a filling gas mixture differing from the composition of air, whose nonlinear refractive index n2 substantially corresponds to that of air and which has a rotational Raman effect which is smaller in comparison with air.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.