Detection of thin line for selective sensitivity during reticle inspection
US8090189B1 · kind B1 · utility
4Cited by
2References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 4, 2008 |
| Grant date | Jan 3, 2012 |
| Priority date | — |
| Expiry date | Nov 3, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Methods and apparatus relating to the inspection of photomasks are described. In an embodiment, detection of thin line or sub-resolution assist features may be used for selective sensitivity during photomask inspection. Other embodiments are also described.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.