Patent · US Active

Method of micro/nano imprinting

US8092737B2 · kind B2 · utility

20Cited by
2References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 3, 2008
Grant dateJan 10, 2012
Priority date
Expiry dateSep 29, 2029

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB29C2059/023
  • WIPO fieldOther special machines
  • WIPO sectorMechanical engineering

Abstract

Disclosed is a method of micro/nano imprinting, which applies soft mold, pre-shaping sealing film, and soft holder arrangements to the micro/nano structure imprinting process of the curved substrates. The method of the present invention can prevent the curved surface from crumbling, which may result from high gas pressuring, and can obtain uniform imprinting pressure distribution throughout the whole curved substrate. Moreover, replicating micro/nano structures onto double-sided curve, both convex and concave, surfaces can also be achieved.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.