Solid-state imaging device
US8093672B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 20, 2006 |
| Grant date | Jan 10, 2012 |
| Priority date | — |
| Expiry date | Jun 25, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F39/026
Abstract
Provided is a manufacturing method of a solid-state imaging device, which is able to realize a solid-state imaging device whose reflection prevention coating is even and that does not have image noise in case of adopting a spincoating method in applying a material of the reflection prevention coating onto microlenses of the solid-state imaging device. In the solid-state imaging device 1 according to the present invention, a barrier wall pattern 7 is formed, as a step alleviating structure, in dicing areas 5X formed between adjacent imaging areas 9. The barrier wall pattern 7 has a rectangular sectional form. With use of the barrier wall pattern 7 in the spincoating method, reflection prevention coating 8 is coated onto the microlenses 6 more evenly than in conventional cases.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.