Patent · US Active

Light sensitive PDMS for complex pattern formation

US8097639B2 · kind B2 · utility

0Cited by

3References

20Claims

0Family size

Assignee

Peking University · CN

Inventors

Hongwei Ma · Beijing, CN
Long Fu · Taipei, TW

Key dates

Filing date	Aug 29, 2008
Grant date	Jan 17, 2012
Priority date	—
Expiry date	May 13, 2029

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08J2383/04
WIPO fieldOrganic fine chemistry
WIPO sectorChemistry

Abstract

Disclosed herein is a surface functionalized poly(dimethylsiloxane) (PDMS) and methods for making the same. The surface functionalized PDMS disclosed herein is applicable in the general field of microfluidics, bioMEMS (bio-microelectromechanical systems), soft lithography, and other related biotechnology fields.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.