Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel
US8098012B2 · kind B2 · utility
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27References
10Claims
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Key dates
| Filing date | Aug 27, 2009 |
| Grant date | Jan 17, 2012 |
| Priority date | — |
| Expiry date | Aug 27, 2029 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a barrier rib for a plasma display panel, wherein the photosensitive composition is used. The photosensitive composition provides improved adherence to an inorganic material and an organic material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.