Patent · US Active

Model based microdevice design layout correction

US8099685B2 · kind B2 · utility

4Cited by

8References

28Claims

0Family size

Assignee

MENTOR GRAPHICS CORPORATION · US

Inventors

Marko P. Chew · Cupertino, US
Yue Yang · Chengdu, CN
Juan Andres Torres Robles · Wilsonville, US

Key dates

Filing date	Jul 31, 2008
Grant date	Jan 17, 2012
Priority date	—
Expiry date	Feb 1, 2030

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02P90/02
WIPO fieldComputer technology
WIPO sectorElectrical engineering

Abstract

Shapes neighboring a potential manufacturing fault within a microdevice design layout are identified. Models are employed to determine the affect of the shapes upon the potential manufacturing fault. Possible adjustments to the shapes are modeled. The possible adjustments facilitating resolution of the potential manufacturing fault.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.