Photomask manufacturing method, photomask manufacturing apparatus and photomask
US8101324B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 9, 2008 |
| Grant date | Jan 24, 2012 |
| Priority date | — |
| Expiry date | Mar 29, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photomask manufacturing method which includes generating data of a main pattern to be transferred onto a substrate, and data of an assist pattern which is arranged adjacent to the main pattern and which assists the transfer of the main pattern without being transferred onto the substrate; performing an optical proximity effect correction to the generated data of the main pattern; correcting shapes of the main pattern and the assist pattern on the basis of a shape change caused at an edge of the main pattern facing the assist pattern by the optical proximity effect correction; and forming a photomask by using the data of the main pattern and of the assist pattern which have been corrected.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.