Method for producing diamond-like carbon coatings using PECVD and diamondoid precursors on internal surfaces of a hollow component
US8105660B2 · kind B2 · utility
Inventors
Key dates
| Filing date | May 1, 2008 |
| Grant date | Jan 31, 2012 |
| Priority date | — |
| Expiry date | Sep 27, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/52
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of forming a diamond-like carbon coating by plasma enhanced chemical vapor deposition on an internal surface of a hollow component having an inner surface. A reduced atmospheric pressure is created within a pipe or other hollow component to be treated. A diamondoid precursor gas is introduced to the interior of the component. A bias voltage is established between a first electrode and one or more second electrodes. The first electrode is or is attached to the component. The second electrode is externally offset from an opening of the component, by a hollow insulator. A plasma region is established adjacent an inner surface of the component and extends through the hollow insulator. The precursor gas comprises at least one diamondoid. The pressure and bias voltage are selected such as to cause the deposition of diamond-like carbon on the inner surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.