Sputtering target for making optical medium, method of making same, optical medium, and method of making same
US8105674B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 12, 2010 |
| Grant date | Jan 31, 2012 |
| Priority date | — |
| Expiry date | Aug 4, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/21
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention aims at providing a sputtering target for making an optical medium whose reflective layer is mainly composed of Ag and capable of attaining an optical medium which is excellent in surface smoothness and can sufficiently suppress noise and jitter, a method of making the same, an optical medium, and a method of making the same. The present invention provides a sputtering target for making an optical medium comprising 0.1 to 2 at % of one or two elements selected from the group consisting of Ta and Nb, 0.1 to 1 at % of Al, and the balance constituted by Ag and unavoidable impurities; and an optical medium comprising a reflective layer having this composition on a substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.