Patent · US Active

Method for etching a see-through thin film solar module

US8105863B2 · kind B2 · utility

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9References
10Claims
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Key dates

Filing dateJul 8, 2010
Grant dateJan 31, 2012
Priority date
Expiry dateJul 8, 2030

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02P70/50

Abstract

This invention discloses a method for etching a see-through thin film solar module, comprising: printing ink paste which resists the etching of etching solutions in the protected area of the thin film solar module which is placed under a screen; drying and solidifying the ink paste; coating etching solutions on the thin film solar module; and removing the ink paste. The method of this invention can accurately position the see-through area, achieve various selections of see-through patterns, facilitate the realization of the see-through function in large-area thin film solar modules, and alleviate the problem that a short circuit easily occurs in a see-through thin film solar module.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.