Polyimide substrate bonded to other substrate
US8107777B2 · kind B2 · utility
Inventor
Key dates
| Filing date | Apr 2, 2009 |
| Grant date | Jan 31, 2012 |
| Priority date | — |
| Expiry date | Mar 21, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/265
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Polyimide substrates are bonded to germanium wafers having an epitaxially grown III-V layer and a metal layer. The polyimide substrate and the Ge, wafer are subsequently thinned by grinding and etching to reach a final thickness of 25 μms Ge on 25 μms adhesive layer on 50 μms polyimide substrate. The choice of adhesive is of paramount importance. There are several requirements for the adhesive layer to act as a permanent carrier of the thin fragile multi junction solar cell. The adhesive must remain flexible after curing and have a low CTE. The use of an adhesive that cures without the addition of heat, preferably at room temperature. Furthermore, the adhesive layer has a uniform thickness preferably less than 25 ums (1 mil) and be void-free. A clear adhesive which does not contain any particles in order to obtain a smooth uniform void-free bond line. However, clear adhesives have CTE's that are larger than 80 ppm/°C. and which can be as high as 200 ppm/°C. or more above the glass transition temperature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.