Method of manufacturing a magnetic sensor with tilted magnetoresistive structures

US8110119B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Marcus Breuer · Oppenheim, DE
• Guenther Crolly · Kirchheimbolanden, DE
• Michael Haag · Boulder, US
• Manfred Jung · Bad Münstereifel, DE
• Thorsten Muehge · Mainz, DE
• Johannes Paul · Mainz, DE
• Joerg Sauerwein · Mainz, DE
• Rolf Schaefer · Mainz, DE
• Alexandra Welzel · Hahnheim, DE

Key dates

• Filing date: Apr 18, 2008
• Grant date: Feb 7, 2012
• Expiry date: Dec 8, 2030

Classification

• Technology area (CPC G): Physics
• CPC primary: G11B2005/3996
• WIPO field: Audio-visual technology
• WIPO sector: Electrical engineering

Abstract

A method of manufacturing a magnetic field sensor device in one embodiment includes applying a mask on a substrate, performing a wet etching procedure on the substrate for generating at least a first groove having tilted side walls, and depositing at least one layer of magnetoresistive material onto a section of the surface of at least a first tilted side wall of the groove. A method of manufacturing a magnetic field sensor device on a substrate having a plurality of tilted planar sections, each of the tilted planar sections having a surface normal angled with respect to a surface normal of the substrate is also provided. The method includes depositing a magnetoresistive layered structure positioned at each of the tilted planar sections of the substrate, wherein the tilted planar sections are oriented such that a direction of an applied magnetic field in at least one of an x-, y- and z-direction relative to the substrate is detectable based on field-induced resistance changes of the magnetoresistive layered structures.