Method for producing a thin-film solar cell by use of microcrystalline silicon and a layer sequence

US8110246B2 · kind B2 · utility

Assignee

• Forschungszentrum Jülich GmbH · DE

Inventors

• Stefan Klein · Meitingen, DE
• Yaohua MAI · Laishui, CN
• Friedhelm Finger · Emmelshausen, DE
• Reinhard Carius · Lich, DE

Key dates

• Filing date: Dec 13, 2005
• Grant date: Feb 7, 2012
• Expiry date: Nov 12, 2027

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02P70/50

Abstract

The invention relates to a method for production of a thin-layer solar cell with microcrystalline silicon and a layer sequence. According to the invention, a microcrystalline silicon layer is applied to the lower p- or n-layer in pin or nip thin-layer solar cells, by means of a HWCVD method before the application of the microcrystalline i-layer. The efficiency of the solar cell is hence increased by up to 0.8% absolute.