Method of manufacture of damascene reticle

US8110321B2 · kind B2 · utility

Assignee

• International Business Machines Corporation · US

Inventors

• Kevin S. Petrarca · Newburgh, US
• Donald F. Canaperi · Bridgewater, US
• Mahadevaiyer Krishnan · Hopewell Junction, US
• Rebecca D. Mih · Wappingers Falls, US
• Steven E. Steen · Titicus, US
• Henry Grabarz · Shelton, US
• Michael S. Hibbs · Colchester, US

Key dates

• Filing date: May 16, 2007
• Grant date: Feb 7, 2012
• Expiry date: Sep 12, 2030

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F1/50
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A method for manufacturing an optical projection reticle employs a damascene process. First feature recesses are etched into a projection reticle mask plate which is transmissive or transparent. Then feature recesses are tilled with a radiation transmissivity modifying material comprising a partially transmissive material and/or a radiation absorber for absorbing actinic radiation. Sacrificial materials may be added to the recess temporarily prior to filling the recess to provide gaps juxtaposed with the material filling the recess. Thereafter, the sacrificial materials are removed. Then the projection mask is planarized leaving feature recesses filled with transmissivity modifying material, and any gaps desired. The projection mask is planarized while retained in a fixture holding it in place during polishing with a polishing tool and a slurry.