Controlled plasma power supply
US8110992B2 · kind B2 · utility
37Cited by
52References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Sep 10, 2010 |
| Grant date | Feb 7, 2012 |
| Priority date | — |
| Expiry date | Sep 10, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0206
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma power supply system for producing electrical power in the range between 1 kW and 100 kW for a plasma processing system and supplying the power to a plasma chamber through a power line connection, the plasma power supply system includes a power converter, a monitoring section, an arc diverter, a control section with an arc diverter control section and an arc detection section, and an input device wherein the input device is connected to the arc diverter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.