Patent · US Active

Polyvinylammonium compound, method of manufacturing same, acidic solution containing said compound and method of electrolytically depositing a copper deposit

US8114263B2 · kind B2 · utility

2Cited by

6References

12Claims

0Family size

Assignee

Atotech Deutschland GmbH & Co. KG · DE

Inventors

Wolfgang Dahms · Berlin, DE
Udo Grieser · Berlin, DE
Philip Hartmann · Berlin, DE

Key dates

Filing date	Mar 1, 2006
Grant date	Feb 14, 2012
Priority date	—
Expiry date	Sep 28, 2028

Classification

Technology area (CPC H)Electricity
CPC primaryH05K3/423
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

The invention relates to a polyvinylammonium compound, to a method of manufacturing said compound, to an aqueous acidic solution containing at least said Polyvinylammonium compound for electrolytically depositing a copper deposit as well as to a method of electrolytically depositing a copper deposit using said aqueous acidic solution, said polyinylammonium compound corresponding to the general chemical formula (1): as well as to polyvinylammonium compounds of the general chemical formula (1), wherein one of the monomer units or both having indices I and m are present in the neutral form.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.